KDI Scholarships 2027, South Korea (WIPO–KDI MIPD Program)
The KDI School of Public Policy and Management, in collaboration with the World Intellectual Property Organization (WIPO) and the Korean Intellectual Property Office (KIPO), has announced admissions for the Master’s Program in Intellectual Property and Development Policy (MIPD) 2027 intake.
This highly specialized graduate scholarship is designed for international students interested in innovation policy, intellectual property rights, technology governance, and economic development. The program is internationally recognized and supported by leading global institutions.
Degree Level
- Degree Type: Master’s Degree
- Program Name: Master’s in Intellectual Property and Development Policy (MIPD)
- Duration: 1 Year (Full-Time)
- Structure: 3 Academic Terms
- Credits Required: Minimum 36 Credits (including research project)
Available Subjects
The MIPD program focuses on interdisciplinary training in:
- Intellectual Property Rights (IPR)
- Innovation and Technology Policy
- Public Policy and Governance
- Development Economics
- Law and Legal Frameworks of IP
- Patent Systems and Administration
- Startup and Innovation Ecosystems
- International Trade and Development Policy
Benefits
Selected candidates may receive comprehensive academic and professional support, including:
- Full or partial tuition support (depending on selection category)
- Study at KDI School of Public Policy and Management (South Korea)
- Joint academic framework with WIPO and KIPO
- Access to global IP and innovation experts
- Exposure to Korea’s advanced innovation ecosystem
- Networking with policymakers and international professionals
- Career opportunities in:
- Government agencies
- International organizations (WIPO, UN-related bodies)
- Research institutions
- Patent offices
- Innovation and tech policy organizations
Eligible Nationalities
- Open to all international students
- Applicants from developing and developed countries worldwide are eligible
- No nationality restrictions apply
Eligibility Criteria
Applicants must meet the following requirements:
Academic Requirements
- Bachelor’s degree (any discipline related to policy, law, economics, technology preferred)
- Strong academic background required
Professional Background (Preferred)
- Government officials
- Patent/IP office staff
- Researchers or academics
- Legal professionals
- Development or innovation sector workers
- Startup ecosystem professionals
Language Requirement
English proficiency is mandatory. Accepted tests include:
- TOEFL iBT: 72+
- IELTS: 6.0+
- Duolingo English Test: 100+
- TEPS: 286+
- OPIc: IM3 or higher
Exemption: Applicants from English-speaking countries or those with prior English-taught degrees may be exempt.
Application Procedure
Required Documents
Applicants must prepare:
- Completed online application form
- Statement of Purpose (SOP)
- Bachelor’s degree certificate (English version)
- Academic transcripts
- Two recommendation letters
- English proficiency test score (if required)
- Passport copy / photo
- Employment certificate (optional)
- Master’s documents (if applicable)
Application Process
Applicants must apply through two systems:
Step 1: KDI School Application
- Submit online application via KDI admission portal
- Upload all required documents
Step 2: WIPO Application
- Complete additional application through WIPO portal
- Follow instructions provided in official guidelines
Step 3: Selection Process
- Document screening
- Interview (selected candidates)
- Final admission decision
Admission Timeline (Spring 2027)
- Applications Open: 1 June 2026
- Deadline: 31 July 2026
- Document Review: August 2026
- Interviews: September 2026
- Results Announcement: Mid-October 2026
- Registration: Oct–Nov 2026
- Classes Begin: February 2027
Key Advantages of the Program
- Study in one of Asia’s top policy graduate schools
- Learn from global intellectual property experts
- Gain hands-on exposure to real-world policy systems
- Build international career pathways
- Understand Korea’s innovation-driven development model
